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6th Colloquium Thin Films in Optics Part 6

To shorten the wait for the 14th ThGOT and the 6th Optics Colloquium we would like to give you a small foretaste of our numerous exciting technical presentations in the coming weeks.


Low Temperature Photochemical Preparation of Iron(III) Oxide Thin Films
Patrick C. With / Leibniz Institute of Surface Engineering (IOM) - Chemical Department, Leipzig


Thin-film iron oxides possess semiconducting properties and high chemical stability which were utilized for a variety of applications in gas sensing, as catalysts, as optical coating, for solar water splitting, as well as in electrical and magnetic devices. Common approaches to deposit iron oxide thin films include chemical or physical gas phase deposition methods, reactive sputtering and sol-gel techniques. Typically, annealing at temperatures above 350 °C is needed to create 'clean' iron oxide thin films, due to the high pyrolysis temperature of organic compounds, as well as the high activation energy for dehydroxylation reactions in sol-gel processes.

Photochemically assisted processes are able to overcome temperature related issues since they can be run close to ambient conditions, as shown in our previous works on titanium and aluminum oxides [1,2]. In addition, roll-to-roll applicability of the process was demonstrated for SiOx thin films [3]. This study highlights a low-temperature photochemical synthesis route for the prepa-ration of amorphous iron(III) oxide thin films. For this, iron(III) tert-butoxide [Fe(OtBu)3]2 precursor thin films were converted using energy-rich vacuum UV light (VUV) under an oxidative atmosphere. Besides thin film characterization, we intend to give a first insight into reaction pathways investigated by DFT calculations.


This talk will be presented on 03/14/2019 at 13:45 in the 6th Colloquium Thin Films in Optics


Area inline monitoring of surfaces
Dr. Ferdinant Bammer / TU Vienna - Institute for Manufacturing and High Power Laser Technology, Vienna (Austria)

The inline control of the quality of a two-dimensional machining process, for example the thickness of a coating, is in many cases only carried out by point-like moving sensors, so that no 100% control is possible. We present a two-dimensional measuring system, based on ellipsometry, which enables full-area monitoring in real time, especially for R2R applications.

The polarization state of the light reflected from the surface to be examined is evaluated along a line up to 250mm long and the desired measured value is calculated from this by means of modeling.

The method works mono-chromatically and is realized in NIR and IR. It uses no moving components and is therefore robust and simple.


This talk will be presented on 03/14/2019 at 15:45 in the 6th Colloquium Thin Films in Optics