Menu Close

A look at the conference program: SESSION B Part 2

To shorten the wait for the 14th ThGOT and the 6th Optics Colloquium we would like to give you a small foretaste of our numerous exciting technical presentations in the coming weeks.


Multifunctional plasma and coating sensor for characterization of plasma sources for coating and etching processes
Klaus Ellmer, Optotransmitter-UmweltschutzTechnologie e.V., Berlin

A multifunctional plasma and coating sensor based on a conventional oscillating crystal for coating thickness measurement is presented [1]. It can be used to measure quasi-simultaneously the deposition/etching rate, the energy flux and the plasma parameters (plas-madiche, electron temperature).
By combining the different measurands, the parameters ion/neutral particle ratio and average energy per deposited layer particle can be calculated, quantities that are fundamental for the characterization of plasma and etching processes.
By moving the sensor or the plasma source relative to each other, radial or axial profiles of the plasma source can be acquired with a spatial resolution of about 8 mm (opening of the oscillating quartz).
The sensor is demonstrated for 2 different magnetron discharges and for the avoidance of an RF ion source.
This novel sensor is a compact and simple tool for characterizing a wide variety of plasma sources.


This talk will be presented on March 12, 2019 at 3:50 p.m. in SESSION B: NEW TRENDS IN SURFACE TECHNOLOGY.


Comprehensive Optical Spectroscopy Study of TiO2 Layers
Teresa I. Madeira, Chemnitz University of Technology - Semiconductor Physics, Chemnitz

Titanium dioxide (TiO2) with a band gap of ca. 3.2eV has many potential applications, for instance in photovoltaics, photocatalysis, and gas sensing. Here we present the investigation of TiO2 layers which were prepared by plasma and flame chemical vapour deposition as well as by DC sputtering using the combination of Raman and infrared spectroscopies with spectroscopic ellipsometry.

While the vibrational spectroscopies are very sensitive to the phases (anatase and rutile) as well as the crystallinity, spectroscopic ellipsometry allows the optical constants, the layer thickness, surface roughness, and porosity of the deposited films to be determined. From the breadth of results it is possible to define the optimal deposition conditions and technique to achieve the desired TiO2 phase and film thickness for a specific technological application.


This talk will be presented in SESSION B: NEW TRENDS IN SURFACE TECHNOLOGY on March 12, 2019 at 4:10 pm.